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Episode 31 features German ALD professor, Dr. Martin Knaut. Martin is the chair for the Institute of Semiconductor and Microsystems Technology at TU Dresden and the atomic layer processing group leader. He is also a founding member of the Atomic Layer Process Innovation Network, or ALPIN, organizer of the annual ALD for Industry event, and runs a small in situ tool development company, called ALS Metrology. With a long career working with ALD in Dresden, at the likes of Infineon and Qimonda, Martin has witnessed the ebbs and flows of the semiconductor industry in the state of Saxony. Martin and Tyler discuss the goal of the Silicon Saxony organization, how we can better recruit students in microelectronics, and why he originally started the Atomic Layer Process Innovation Network. They also discuss his company, ALS Metrology, the importance of using in situ monitoring for process development, and his work on flash-enhanced ALD. In this episode: 00:00 Intro 01:48 Martin’s background & semiconductors in Dresden 10:00 Recruiting issues for microelectronics 17:29 ALPIN & ALD for Industry events 29:34 ALS Metrology 34:57 Importance of in situ monitoring 41:59 Flash-Enhanced ALD 53:55 Concluding remarks

  In this episode, Tyler is joined by Professor Carl Hägglund from Uppsala University. They discuss Carl’s motivations for pursuing ultrathin solar cells, how he learned ALD at Stanford in Stacey Bent’s lab, and an unlikely research connection through his child’s school. They also talk about why ALD is useful for plasmonic solar cells, optimization of SnS ALD and his planned path towards a fully realized ultrathin photovoltaic.  00:00 Introduction  01:45 Motivation for fabricating plasmonic solar cells  09:58 Learning ALD at Stanford  22:46 Optimizing SnS ALD process  30:33 Path towards an ultrathin solar cell 

Dr. Suvi Haukka, former executive technologist at ASM, ASM Fellow and ALD Innovator Awardee, joins Tyler for Episode 29. Suvi began her ALD career at Microchemistry in Finland working on atomic layer epitaxy on catalysts for under the direction of ALD technology inventor, Tuomo Suntola. She continued with Microchemistry as head of the thin film development group before spending most of her time teaching the world’s biggest semiconductor companies, like Intel and Samsung, about ALD. Suvi is one of the integral people in introducing ALD to the semiconductor industry in the 2000s.  Suvi and Tyler discuss how she started working with ALD, what it was like to do a PhD with Tuomo Suntola, and how the make up of Microchemistry changed over the years. We also discuss the circumstances surrounding the ASM acquisition, how development changed under new leadership, and how it felt pitching ALD to the semiconductor industry.   In this episode:    00:32 Introduction to Microchemistry  06:01 Doing a PhD with Tuomo Suntola  19:00 Visiting semiconductor companies  25:37 Post-ASM acquisition   

In Episode 28 of ALD Stories, Tyler is joined by Aalto University’s Hele Savin. Hele is a professor in the department of Electronics and Nanoengineering where she uses ALD to engineer photovoltaics and semiconductor devices. In 2017, Hele was awarded the women’s innovation prize from the Finnish parliament after fabricating a black silicon solar cell with a record-breaking 22.1% efficiency and currently uses ALD to create induced junction photodiodes with over 100% external quantum efficiency.     Hele and Tyler discuss how she was first exposed to ALD by Beneq, a mindset that using ALD was dirty, and how mind-blowing early ALD passivation results were. We also talk about why ALD oxides are better than thermal SiO2, the theoretical implications of breaking 100% EQE, and upcoming work in up conversion in her lab.    In this episode:    00:00 Intro  07:45 First experience with ALD  16:37 Passivation of Black Si Solar cells  29:52 ALD for Induced Junction Diodes  39:06 Theoretical Implications of High EQE  47:35 Future Up Conversion work

For Ep. 27, Dr. Rob Clark from Tokyo Electron joins to discuss his rise from an equipment know-nothing to ALD process engineer extraordinaire. Rob, the self-proclaimed Manipulator of Matter, is a Senior MTS and Technology Director at TEL where he leads process and integration of thin film deposition methods for next-generation semiconductor devices.     Recorded live at ALD ALE 2023 in Washington, Rob and Tyler discuss how he first learned ALD on CVD equipment, the early days of high-k ALD process development, and his work in making some of the first hafnium precursors for ALD integration in semicon at Schumacher. They also talk about his time as the only engineer at NanoFab North in Albany, how incredibly advanced semiconductor technology has become, and what the next decade of ALD research might look like.    In this episode:    00:00 Introduction   01:58 Post-grad at Schumacher  13:23 Learning the ALD ropes  19:16 Early HfO2 process development  23:40 Albany, NY Semi ecosystem  32:32 ALD process development insights  42:24 How cool are semiconductors?!’  49:44 Rob’s ALD Outlook

In Episode 26, Professor Stacey Bent from Stanford University joins to discuss all aspects of her career, including early area selective deposition work, how her different academic appointments in chemistry and engineering have influenced the direction of her work, and how ALD can be used in energy applications. Stacey and Tyler also chat about how Stacey finds the best paths for her students, how being a professor and Vice Provost feedback to each other, and new programs she has initiated in her Vice Provost position. In this episode: 00:00 Introduction 03:45 Area Selective Work 15:40 Chemistry & Engineering Backgrounds 21:20 ALD for energy applications 33:54 Stacey as an advisor 36:19 Vice Provost position

In its short 50 years of existence, the history of ALD has been of great interest, being heavily researched and documented in the last decade. One can follow the story from many lenses: one in particular is to view the technology’s development is through an equipment perspective. Each milestone in process technology was accompanied and enabled by new ALD tools. Without innovative equipment design, we would not have the vast ALD ecosystem we do today. Via patents and literature, this ALDeep Dive will journey the evolution of the ALD reactor. It starts from Tuomo Suntola’s original reactor and IP, moves through the early days of commercial reactors, explore the introduction of plasma, powder and spatial tools, and wrap up with today’s equipment landscape and thoughts on the personal aspect of ALD reactors.    In this episode:  00:00 - Intro  01:33 – Suntola’s 1st Reactor  03:15 – Suntola’s Patented Configurations  07:38 – The First Commercial Reactor  10:50 – Plasma, Please  15:20 – Powder ALD Reactors  20:37 – Reintroduction of Spatial ALD  24:10 – Today’s ALD Tool Landscape  25:43 – Concluding Thoughts    Important Papers & Patents  Chem. Vap. Dep. 2014, 20, 10-11-12, 332-344  T. Suntola, J. Antson, International patent, FIN 52359, US 4 058 430, priority Nov 29, 1974, publication Nov 15, 1977.  T. Suntola, A. Pakkala, S. Lindfors, International patent, FIN 57975, US 4 413 022, priority Feb 28, 1979, publication Nov 1, 1983.  J. Vac. Sci. Technol. A, Vol.29, No.5, Sep/Oct 2011  J. Vac. Sci. Technol. A 25 (5) Sep/Oct 2007  Applied Physics Letters 92, 192101 (2008)  Journal of Vacuum Science & Technology A 30, 021502 (2012)

Dr. Fred Roozeboom joins ALD Stories for Ep. 24. Fred spent most of his career in the semiconductor industry at Philips and NXP working on rapid thermal processing and passive integration. He pivoted to ALD at the TNO Holste Centre and now finds himself at his alma mater, University of Twente. Fred was recently awarded the Gordon E. Moore Medal for Outstanding Achievement in Solid State Science and Technology from the ElectroChemical Society. Fred and Tyler talk about the semiconductor industry in the 80’s, his original RTP work at Phillips, and the importance of passive integration. They also discuss the Medtronic pacemaker, his world record during the great reintroduction of spatial ALD and the applications he’s most excited to see come to life with atomic layer deposition.    In this episode:    00:00 Introduction  01:43 Semiconductor Industry in the 80’s  07:59 Rapid Thermal Processing & Creation of NXP  19:32 Passive Integration & 3D Silicon  33:41 Pivot to ALD  46:48 Fred’s ALD Outlook    #ALDep #semiconductors #nanotechnology 

In Episode 23 of ALD Stories, Dr. Harm Knoops joins Tyler to discuss his dual role at Eindhoven University and Oxford Instruments Plasma Technologies. As an Atomic Scale Specialist, Harm routinely advises on processes in ALD, ALE and 2D materials while informing their work with supplemental research at Eindhoven. Harm and Tyler talk about alternatives careers to the traditional industry and academia binary, how scientists can leverage their technical knowledge, and how working in a cross-institute position makes for efficient science. We also touch on Harm’s work with plasmas, tackle misconceptions about plasma conformality, and how Harm approaches learning new topics.    In this episode:    00:00 Intro  01:20 Working in both industry & academia  11:45 Careers leveraging technical backgrounds  24:20 Misconceptions about plasma conformality  43:20 How to learn new fields quickly    #ALDep #ALEtch #nanotechnology  

Professor Sean Barry from Carleton University joins Tyler on Episode 22 of ALD Stories. Sean recalls his time working at the University of Helsinki and a mishap or two in Mikko Ritala’s lab, how the Finnish ethos inspires him, and why he considers Helsinki his second city. Sean also talks about how knowledge of fundamental chemistry is important for understanding atomic layer deposition, why he decided to write a book on the topic, and how chemistry informed the evolution of gold ALD.    In this episode:    00:00 Intro  01:22 Living in Helsinki  09:30 Sean’s background and Harvard ALD  21:00 Evolution of Au ALD  32:05 Sean’s book  45:17 What material is Sean’s dream?  50:23 Sean’s sage wisdom    #ALDep #nanotechnology #chemistry #ALDStories

In Episode 21, John Hennessy from NASA’s Jet Propulsion Lab joins ALD Stories to talk about his work using ALD to deposit UV coatings for astronomical imaging applications. John talks about the relationship between NASA and JPL, how UV coatings allow us to see more of the universe, and how the technology has improved since the Hubble Space Telescope. John and Tyler also discuss how to test the readiness of devices for eventual launch and NASA’s Decadal Survey for deciding new mission concepts.    In this episode:  00:00 Intro  01:48 John’s Background  09:49 NASA/JPL Relationship  14:05 UV Coatings, Detectors and Telescopes  31:51 Testing coatings for launch  40:30 NASA Decadal Survey  46:49 Outlook and Outro    #ALDep #ALDStories #optics #space #nanotechnology 

In Episode 20, Jonas Sundqvist, ALD researcher, entrepreneur and consultant joins Tyler for his 3rd time on the show to talk about his company, AlixLabs (Eps. 4 & 7). AlixLabs has developed a cutting-edge technology called Atomic Pitch Splitting (APS) which utilizes a topographically-selective atomic layer etching process. Jonas discusses how APS works, why they could potentially pattern substrates without the use of multiple lithography steps, and how AlixLabs can offer semiconductor manufacturers with a simpler, more cost-effective and more precise method of creating features with nanometer spacings.  In this episode:    00:00 Introduction  02:55 AlixLabs and APS Background  08:30 Topographical Selectivity  13:30 APS vs Traditional Patterning  24:30 Cost and Implementation  33:05 AlixLabs Outlook